Effect of Different Treatment on the Adsorption of p-Cresol by Activated Carbon
DOI:
https://doi.org/10.18321/ectj590Abstract
Adsorption of p-Cresol by three activated carbons (one untreated and two treated) was carried out at 301 K and at controlled pH conditions. By treating the activated carbon the PZC and adsorption capacity (Qmax) of carbon change. The adsorption capacity of each carbon, by using the homogenous Langmuir-Freundlich model, was found to comparing the effect of different treatment. At pH lower than pKa of p-cresol (molecular form), it was observed that the electron density of aromatic ring and also those of the carbon surface, are the main forces involved in the adsorption process, by affecting the extent of London dispersion forces. Treating by H2 increase the PZC and treating by H2SO4 decrease this factor. At higher pH (in ionic form), it was found that the electrostatic forces played a significant role on the extent of adsorption. In this condition the adsorption of the solute dependent on the concentration of anionic form of the solute. The effect of pH must be considered from its combined effects on the carbon surface and on the solute molecules. It was found that the uptake of the molecular form of the aromatic solute was dependent on the PZC of the carbon.
References
(2). Rodriguez-Reinoso, F., M. Molina-Sabio, and M.T. Gonzalez, Langmuir, 1997. 13: p. 2354.
(3). Hassler, J.W. 1951, Chemical Publishing CO., INC.: New York. p. 127.
(4). Coughlin, R., W. and F.S. Ezra. Environmrntal Science and Technology, 1968. 2: p. 291.
(5). Ward, T.M. and F.W. Getzen, Environmenmtal Science and Technology, 1970. 4: p. 64.
(6). Hsieh, C. and H. teng. Journal of Colloid and Interface Science, 2000. 230: p. 171.
(7). Nouri, S., Adsorption Science & Technology; 2002, vol. 20 No.9, p. 917
(8). Nouri, S., F. Haghseresht and G. Q. Lu; Journal of Amir Kabir, 2002, vol. 13, no. 49, p26
(9). Nouri, S., F. Haghseresht and M. Lu, Iranian Journal of Science and Technology, 2002, Summer A2, 26,
p. 371.
(10). Nouri, S., F. Haghseresht and G. Q. Lu; Adsorption Science & Technology; 2002, vol. 20 No.1, p. 1.
(11). Nouri, S., F. Haghseresht; Adsorption Science & Technology; 2002, vol. 20 no.4, p. 417
(12). Radovic, L.R., et al., Carbon, 1997. 35(9): p. 1339.
(13). Radovic, L.R., Surface Chemistry og Activated Carbon Materials: State of the Art and Implications for Adsorption, in Surfaces of Nanoparticles and Porous Materials, J.A. Schwarz and C.I. Contescu, Editors. 1999, Marcel Dekker: New York.
(14). Getzen, F.W. and T.M. Ward. Journal of Colloid and Interface Science, 1969. 31: p. 441.
(15). Rosene, M.R. and M. Manes. Journal of Physical Chemistry, 1977. 81: p. 1651.
(16). Muller, G., C.J. Radke, and J.M. Prausnit. J. Phy. Chem., 1980. 84: p. 369.
(17). Muller, G., C.J. Radke, and J.M. Prausnitz. Journal of Colloid abd Interface Science, 1985. 103: p. 466.
(18). Muller, G., C.J. Radke, and J.M. Prausnitz. Journal of Colloid abd Interface Science, 1985. 103: p. 484.
(19). Gregg, S. J.;. Sing, K. S.W. (1982) Adsorption, Surface AreaandPorosity; Academic Press, London.
(20). Marsh, H., (1987), Carbon, 25, 49.
(21). Barton, S. S.; Evans, J. B.; MacDonald, J. A. F., (1991), Carbon, 29 (8), 1009.
Downloads
Published
How to Cite
Issue
Section
License
You are free to: Share — copy and redistribute the material in any medium or format. Adapt — remix, transform, and build upon the material for any purpose, even commercially.
Eurasian Chemico-Technological Journal applies a Creative Commons Attribution 4.0 International License to articles and other works we publish.
Subject to the acceptance of the Article for publication in the Eurasian Chemico-Technological Journal, the Author(s) agrees to grant Eurasian Chemico-Technological Journal permission to publish the unpublished and original Article and all associated supplemental material under the Creative Commons Attribution 4.0 International license (CC BY 4.0).
Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.