Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

  • P. K. Purnapu Rupa Non Ferrous Materials Technology Development Centre, PO Kanchanbagh, Hyderabad 500058, India
  • P. C. Chakraborti Department of Metallurgy and Materials Engineering, Jadavpur University, Kolkata 700032, India
  • S. K. Mishra National Metallurgical Laboratory, Jamshedpur 831007, India


Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology is presented to evaluate the critical load to failure directly from the load depth curves. Significant effect of Ar:N2 ratio was observed on the mechanical properties of the Ti-B-N films.


1. Wiedemann, R., Weihnacht. V., and Oettel, H., Surf. Coat. Technol. 116–119: 302 (1999).

2. García-Luis. A., Brizuela. M., Oñate, J.I., Sánchez-López, J.C., Martínez-Martínez, D., López-Cartes, C., and Fernández, A., Surf. Coat. Technol. 200: 734 (2005).

3. Lu, Y.H., Shen, Y.G., Zhou, Z.F., and Li, K.Y., J. Vac. Sci.Technol. A 24: 340 (2006).

4. Mayrhofer, P.H., Mitterer, C., Wen, J.G., Petrov, I., Greene, J.E., J. Appl. Phys. 100: 044301 (2006).

5. Musil, J., Surf. Coat. Technol. 125: 322 (2000).

6. Karvankova, P., Veprek-Heijman, M.G.J., Zindulka, O., Bergmaier, A., and Veprek, S., Surf. Coat. Technol. 163–164: 149 (2003).

7. Novotny, H., Benesovsky, F., Brukl, C., and Schob, O., Mh. Chem. 92: 403 (1961).

8. Berger, M., Coronel, E., and Olsson, E., Surf. Coat. Technol. 185: 240 (2004).

9. Rupa, P. K. P., Chakraborti P. C., and Mishra, S. K., Thin Solid Films. 517: 2912 (2009).

10. Oliver, W.C., Pharr, G.M., J. Mater. Res. 7: 1564 (1992).

11. Sneddon, I. N., Int. J. Eng. Sci. 3: 47 (1965).

12. Lopez-Cartes, C., Martínez-Martínez, D., Sanchez-Lopez, J. C., Fernández, A., GarcíaLuis, A., Brizuela, M., and Onate, J. I., Thin Solid Films. 515: 3590 (2007).

13. Heau, C., and Terrat, J. P., Surf.Coat.Technol. 108-109: 332. (1998).
How to Cite
P. Purnapu Rupa, P. Chakraborti, and S. Mishra, “Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering”, Eurasian Chem.-Technol. J., vol. 13, no. 1-2, pp. 81-84, Apr. 2011.