Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering
DOI:
https://doi.org/10.18321/ectj70Abstract
Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology is presented to evaluate the critical load to failure directly from the load depth curves. Significant effect of Ar:N2 ratio was observed on the mechanical properties of the Ti-B-N films.
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