Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering


  • P. K. Purnapu Rupa Non Ferrous Materials Technology Development Centre, PO Kanchanbagh, Hyderabad 500058, India
  • P. C. Chakraborti Department of Metallurgy and Materials Engineering, Jadavpur University, Kolkata 700032, India
  • S. K. Mishra National Metallurgical Laboratory, Jamshedpur 831007, India



Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology is presented to evaluate the critical load to failure directly from the load depth curves. Significant effect of Ar:N2 ratio was observed on the mechanical properties of the Ti-B-N films.


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How to Cite

Purnapu Rupa, P. K., Chakraborti, P. C., & Mishra, S. K. (2011). Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering. Eurasian Chemico-Technological Journal, 13(1-2), 81–84.