Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

  • P. K. Purnapu Rupa Non Ferrous Materials Technology Development Centre, PO Kanchanbagh, Hyderabad 500058, India
  • P. C. Chakraborti Department of Metallurgy and Materials Engineering, Jadavpur University, Kolkata 700032, India
  • S. K. Mishra National Metallurgical Laboratory, Jamshedpur 831007, India

Abstract

Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology is presented to evaluate the critical load to failure directly from the load depth curves. Significant effect of Ar:N2 ratio was observed on the mechanical properties of the Ti-B-N films.

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Published
2011-04-22
How to Cite
[1]
P. Purnapu Rupa, P. Chakraborti, and S. Mishra, “Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering”, Eurasian Chem.-Technol. J., vol. 13, no. 1-2, pp. 81-84, Apr. 2011.
Section
Articles