Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering
DOI:
https://doi.org/10.18321/ectj70Abstract
Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology is presented to evaluate the critical load to failure directly from the load depth curves. Significant effect of Ar:N2 ratio was observed on the mechanical properties of the Ti-B-N films.
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4. Mayrhofer, P.H., Mitterer, C., Wen, J.G., Petrov, I., Greene, J.E., J. Appl. Phys. 100: 044301 (2006).
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Published
22-04-2011
How to Cite
Purnapu Rupa, P. K., Chakraborti, P. C., & Mishra, S. K. (2011). Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering. Eurasian Chemico-Technological Journal, 13(1-2), 81–84. https://doi.org/10.18321/ectj70
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